Inspection Equipment System For SiC (NOVA-2000) is designed for defect inspection of SiC substrate wafers and homogeneous epitaxial wafers. It features a dedicated multi-channel optical inspection system and an automatic defect detection and classification algorithm tailored for the diversity of SiC defects.The equipment detects and categorizes defects such as micropipes, stacking faults, triangular defects, step bunching, and more, significantly enhancing SiC quality control and process optimization.
Inspection Equipment For SiC |
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Model |
NOVA-2000 |
Wafer Type |
SiC Substrate, Epitaxial Wafers |
Wafer Size |
4 inches, 6 inches, 8 inches |
throughput |
10WPH (6-inch) |
Loading/Unloading |
Fully Automated, 2 Loadport, 1 Robot |
Operating Temperature |
20°C~25°C |
Operating Humidity |
40%~60% |
Cleanroom Class |
Class 100 or Higher |
Note: We can provide customized instruments of the same type and related testing solutions according to customer requirements.
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Multi-channel Optical inspection System1
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High Cleanliness Standards2
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Traceable Inspection Data3
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Intuitive Operation Software4
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Real-time Auto-focus5